Prime-Grade Silicon Substrate is Used in the Electronic Industry!

If you will say that you have not seen the use of silicon wafer ever in your life, then it can be a blasphemy. Most of us in this world have seen such use as these items are quite common for us. And now these wafers are being used for the making of certain devices that we use in our day to day life in order to make life simple and more convenient. Devices like computers and mobile phones are best examples of it. So, the question is what the silicon wafer is and what sort of usage it can bring? This material is mostly used to make the semiconductors. These semiconductors can be traced with almost any electronic device that we use these days. These devices are also making peoples’ life more convenient and easier. Due to this reason, we are buying such products in great numbers and ultimately the use of the silicon wafers is also growing exponentially.

prime-grade silicon substrate

·         Comes with a mirror finished surface

In order to make these materials, there is always a need for the prime-grade silicon substrate. As the second most available material in this universe, silicon is present with almost everything around us. In the electronic sector and for the making of semiconductor technology, these wafers are used in great amount. It comes with a surface that holds a mirror finish.

·         It comes with a subtle surface

These materials also come with the most subtle surface due to which it is also considered as the flattest object in this world.

Silicon Thermal Oxide Wafer is Produced Through Thermal Oxidation!

In order to produce the fused silicon wafer thermal oxidation is the process that is considered on a high node. This is a process during which the silicon wafer is exposed to the combination of certain oxidizing agents as well as heat. This is how the layers of silicon dioxide are produced. Such layers are mostly made with oxygen, hydrogen and some amount of halogen gas. The growth of silicon dioxide uses to take place on the wafers that are present under ambient air that can have a thickness of around twenty angstroms. For the specific growth of silicon thermal oxide wafer, a heat source can be used so that the reaction can be catalyzed and the 25,000 angstroms of oxide layers can be achieved. These wafers can be used for a wide range of applications. However, they are primarily used for the dielectric material as well as for the MEMS devices or known as the microelectromechanical systems. 

Silicon thermal oxide wafer

• Know more about the oxidation process

In order to perform the thermal oxidation process for the silicon wafers, there are two methods followed. Well, for both these methods, the growth of the oxygen is always vital and this needs to be done on the surface of such a wafer. Well, this method differs from the CVD applications as per which the oxide layer uses to get deposited on the silicon wafer. SiO2 fused silica wafer is used for the electronic devices most of the time.

• Get it at an affordable price

When you are looking for the best silicon wafer, you should go for the prime grade one. The top supplier of silicon wafer offers such products at affordable prices now.