Must-know facts about P-type Boron-doped 200nm SiO2 thermal oxide wafer?

Prime-grade 4 inch silicon wafer is open in a combination of assessments, from prime assessment wafers to InP recuperate wafers—they are gathered by their quality. Every assessment of silicon also has its properties and applications.

P-type Boron-doped 200nm SiO2 thermal oxide wafer is molded on revealed silicon surface at a raised temperature inside seeing an oxidant; the method is called warm oxidation. Warm oxide is commonly filled in an even chamber warmer, at a temperature range from 900°C ~ 1200°C, using either a "Wet" or "Dry" advancement technique. Warm oxide is such a "created" oxide layer, stood out from CVD saved oxide layer, it has a higher consistency, and higher dielectric quality, and it is an extraordinary dielectric layer as a separator. Deepest silicon-based devices, the warm oxide layer anticipates an enormous capacity to pacify the silicon exterior to go about as doping hindrances as well as as surface dielectrics. SWI gives warm oxide wafer in estimation from 2" to 12 ", we by and large pick prime assessment and flaw free P-type Boron-doped 200nm SiO2 warm oxide wafer as a substrate for growing high consistency warm oxide layer to meet your specific necessities. Contact us for extra information on expense and transport time.

P-type Boron-doped 200nm SiO2 Thermal Oxide Wafer

Prime Grade

Prime-Grade 4 Inch Silicon Wafer can be used for everything, from conveying semiconductor contraptions to building electronic devices. They're the most raised assessment of silicon wafers. They're generally called Gadget quality because of their ability to offer extreme resistivity specs, bewildering quality, extended future, and the significantly cleaned and clean wafer surface. They're all the more exorbitant diverged from various types of assessments; notwithstanding, their quality and execution legitimize their cost.

SiO2 Thermal Oxide Wafer is Made from the Most Available Material!

If you are really living in the modern day’s society, then there is always a chance for you to use the silicon wafer knowingly or unknowingly. These items have really managed to bring a revolution in the semiconductor manufacturing sectors. With these wafers, the making of the semiconductors cannot be imagined. So, now you might be thinking that where you have used these items? Well, the answer right at what you are holding in your hand. Yes, it’s the mobile phone or the smartphone that you are using now is such a device for which the silicon wafers are used to keep its use safe for you. The use of these wafers has really made the whole process safer and convenient. Smartphones and computer are the devices that we using on a daily basis. We use these devices to accomplish a wide range of works. But we never know that these devices run so smoothly and safely due to the use of the silicon thermal oxide wafer.

SiO2 Thermal Oxide Wafer

• Produced from a highly available material

Before we delve deep into the use of the silicon wafer, we should first know a few things about silica. It is the mostly found material in this universe and on our earth; this material is located in great amount. Pick just anything around you like the sand and silica is there. So, from this you can understand that it is also a very vital element for the entire universe. The SiO2 thermal oxide wafer is produced while using this silica.

•  Fabrication process can differ

There is a wide range of fabrication methods applied to produce the silicon wafers for the market. If you are looking for the top quality silicon thermal oxide wafer, then you must collect it from the leading supplier.

Silicon Thermal Oxide Wafer is Used as the Dielectric Material!

Silicon is known as the second most available material in the universe. And this is now used in a great amount of make the semiconductors. These items are used for the making of different electronic devices that we use these days to make life simple and convenient. So, you can say that the electronic industry also depends greatly on the production of the silicon thermal oxide wafer. Silicon wafers are something that we have at least seen once in our lifetime. These materials are quite common. The computer you use or the mobile phone that you carry to communicate with others is also made while using the semiconductors. So, it’s the semiconductor technology that is followed now greatly depends on the silicon wafer. These are the thin layers are they are primarily used as the dielectric material. These wafers are also integrated for the MEMS or the micro electro mechanical systems. In order to produce the silicon thermal oxide wafer, the oxidation of the silicon with oxygen needs to be done.

silicon thermal oxide wafer

·         Thermal oxidation process is followed

The thermal oxidation process followed can expose the silicon wafer to the oxidizing agents as well as heat. Due to this process, a silicon dioxide layer is also formed. This type of layer comprises of oxygen and hydrogen. Sometime halogen gas is also used to make the SiO2 thermal oxide wafer.

·         Used as the dielectric material

During this oxidation process, heat source is also used to catalyze the reaction as well as to create the layers of oxide. The applications of these silicon wafers can be many. But mainly they are used as the dielectric material.